Dr. Dimoulas obtained his Ph.D in Applied Physics from the University of Crete in Greece in 1991 on MBE heteroepitaxial gowth and characterization of GaAs and related compounds on Si. He was Human Capital & Mobility Fellow of the EU at the University of Groningen in Holland until 1994, a Research Fellow at the California Institute of Technology (CALTECH), Chemical Engineering, Pasadena USA until 1996 and Research Associate at the University of Maryland at College Park (UMCP) USA, until February 1999. In addition, he was visiting research scientist at NRL, Washington DC in 1992 and at IBM Zurich Resarch Laboratory, Switzerland in 2006 and 2007. Since 1999, he is Research Director and head of the Epitaxy and Surface Science laboratory at the National Center for Scientific Research DEMOKRITOS, Athens, Greece. He has coordinated several European-funded projects in the areas of advanced CMOS, the last being DUALLOGIC, the main CMOS project in FP7 and he is now leading one EU project 2D NANOLATTICES on silicene and other 2D crystal channels for post CMOS applications. Also, he has received the prestigious ERC (IDEAS) Advanced Investigator Grant 2011 -SMARTATE dealing with graphene and topological insulators at the gate of MOS devices for low power electronics and the Greek Excellence (ARISTEIA) project TOP-ELECTRONICS. He has authored or co-authored more than 120 technical presentations in refereed journals including 3 monographs in Springer book chapters on high-k gates on Si and high mobility channels. In addition, he has more than 60 presentations in conferences including 35 invited in conferences, tutorials and summer schools. He has more than 2000 citations and an h–index of 27. He is co-editor in a Springer book and guest editor in three special volumes of international journals. He has organized relevant MRS and E-MRS symposia in 2005, 2003, 2009, 2010 and 2013. He was the general chair of INFOS 2007 conference. He is in the steering committee of INFOS and ESSDERC/ESSCIRC conferences and he has chaired the TPC committee of ESSDERC/ESSCIRC 2007 and Process Technology subcommittee of IEDM 2012. His expertise includes MBE growth of semiconductors and dielectric materials, VCD growth of graphene, nanodevice processing by optical and e-beam lithography and materials characterization & device electrical characterization.