RAPID Reactive Atmospheric Plasma processIng eDucation network Marie-Curie Initial Training Network (MC-ITN): ESR 6 Synthesizing with atomic-level control high-quality, carbon-free dense SiO2 layers
This project aims to explore the deposition mechanism and quality of SiO2like layers developed in a roll-to-roll configuration dielectric barrier discharge from organosilicon/oxygen (air) mixtures. The goal is synthesizing high quality, carbon-free dense SiO2 layers, exhibiting barrier properties for flexible photovoltaics and display applications.
The discharge will also be operated in an atmospheric pressure plasma- assisted atomic layer mode to control at atomic level the microstructure of the layer during its growth.
Nr of positions available : 1
Early stage researcher or 0-4 yrs (Post graduate)
First Stage Researcher (R1)
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TU Eindhoven: Department of Applied Physics Plasma & Materials Processing
P.O. Box 513
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