RAPID Reactive Atmospheric Plasma processIng eDucation network Marie-Curie Initial Training Network (MC-ITN): ER 1 Modeling the growth of oxide films
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A dielectric barrier discharge (DBD) consisting of an organo-silicon precursor in air (e.g., HMDSO) can be used to deposit SiO2 films for flexible photovoltaic and display applications. To improve this application, a good insight in the underlying mechanisms is required. This can be obtained by computer modeling. In this project, the plasma chemistry will be modeled, as well as the interaction of the important plasma species with a growing SiO2 film.
Nr of positions available : 1
Experienced researcher or 4-10 yrs (Post-Doc)
Recognised Researcher (R2)
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University of Antwerp
Campus Drie Eiken, Universiteitsplein 1
FP7/People - Marie Curie Actions
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