Fellowship & Grant details

Fellowship posted by Italian Ministry of Education, University and Research (16/11/2013 02.38)

Deposition of silicon-germanium epilayers for optoelectronic applications

Please note that the job is no longer active!

The research program aims at developing optoelectronic devices based on epitaxial silicon germanium heterostructures. The candidate will perform the epitaxial deposition of SiGe heterostructures, fabricate optoelectronic devices (modulators and photodetectors) by means of optical lithography and characterize them by photocurrent measurements. A relevant topic will be the deposition of heavily doped Ge epilayers for applications in the field of far infrared plasmonics.

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Research Fields


Programme Description
Eligible destination country/ies for fellowsItaly
Eligibility of fellows: country/ies of residenceAll
Eligibility of fellows: nationality/iesAll
Website of Fellowship Programme
Fellowship's Details
Career StageExperienced researcher or 4-10 yrs (Post-Doc)
Research ProfilesNot defined
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Application deadline


Other fellowship details


Funding organisation / Contacts
Dipartimento di Fisica – Politecnico di Milano

Public research
Milano - Italy