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Fellowship & Grant details

Fellowship posted by Italian Ministry of Education, University and Research (16/11/2013 02.38)

X-ray diffraction analysis of strain relaxation mechanisms in silicon-germanium epilayers

Please note that the job is no longer active!

The research program aims at extracting from X-ray diffraction (XRD) measurements information on the mechanism leading to strain relaxation in SiGe epilayers deposited on silicon substrates. In particular the nominee should perform experiments and data analysis aiming at figuring out the nature of misfit and threading dislocations forming during the epitaxial growth of Ge-rich SiGe alloys on substrates with different orientations. The result of such an analysis will be used to develop deposition strategies aiming at reducing the detrimental effects of dislocations on the lifetime and mobility of electrons in heavily doped Ge epilayers to be used for infrared plasmonic applications.

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Research Fields

Engineering
Physics
Technology


Programme Description
Eligible destination country/ies for fellowsItaly
Eligibility of fellows: country/ies of residenceItaly
Eligibility of fellows: nationality/iesAll
Website of Fellowship Programmehttp://www.polimi.it/lavora-con-noi/collaborazioni-di-ricerca/assegnidiricerca/
Fellowship's Details
Career StageExperienced researcher or 4-10 yrs (Post-Doc)
Research ProfileNot defined
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Application deadline

04/12/2013

Other fellowship details
Fellowship ID

62418

Funding organisation / Contacts
Dipartimento di Fisica - Politecnico

Public research
Milano - Italy
www.polimi.it
E-mails
assegniricerca@polimi.it

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